Achieving sub-0.5-angstrom-resolution ptychography in an uncorrected electron microscope

• 成果类型: Article
• 署名作者: Nguyen, Kayla X.; Jiang, Yi; Lee, Chia-Hao; Kharel, Priti; Zhang, Yue; van der Zande, Arend M.; Huang, Pinshane Y.
• 署名单位: University of Illinois System; University of Illinois Urbana-Champaign; United States Department of Energy (DOE); Argonne National Laboratory; University of Illinois System; University of Illinois Urbana-Champaign; University of Illinois System; University of Illinois Urbana-Champaign; University of Illinois System; University of Illinois Urbana-Champaign
• 刊物名称: SCIENCE
• ISSN/ISSBN: 0036-12676
• DOI: 10.1126/science.adl2029
• 发表日期: 2024-02-23
• 页码: 865-870
• 关键词: resolution; diffraction

摘要

Subangstrom resolution has long been limited to aberration-corrected electron microscopy, where it is a powerful tool for understanding the atomic structure and properties of matter. Here, we demonstrate electron ptychography in an uncorrected scanning transmission electron microscope (STEM) with deep subangstrom spatial resolution down to 0.44 angstroms, exceeding the conventional resolution of aberration-corrected tools and rivaling their highest ptychographic resolutions . Our approach, which we demonstrate on twisted two-dimensional materials in a widely available commercial microscope, far surpasses prior ptychographic resolutions (1 to 5 angstroms) of uncorrected STEMs. We further show how geometric aberrations can create optimized, structured beams for dose-efficient electron ptychography. Our results demonstrate that expensive aberration correctors are no longer required for deep subangstrom resolution.